TY - JOUR
T1 - Quantum Plasmonic-Grating Enhanced Topological Heterojunction for Broadband Photodetection
AU - Hlaing, May Zin
AU - Theja, Vaskuri C.S.
AU - Karthikeyan, Vaithinathan
AU - Oo, May Thawda
AU - Huqe, Md Rashedul
AU - Yeung, Chi Shun
AU - Kannan, Venkataraman
AU - Roy, Vellaisamy A.L.
N1 - Publisher Copyright:
© 2025 Wiley-VCH GmbH.
PY - 2025/10/2
Y1 - 2025/10/2
N2 - Topological insulators continue to be promising candidates for broadband photodetection owing to their robust surface states and superior optoelectronic properties. Here, an advanced heterojunction photodetector composed of p-type Sb₂Te₃ and n-type Bi₂Te₃ is reported, whose performance is significantly enhanced through the integration of plasmonic grating electrodes. The plasmonic gratings concentrate the incident electromagnetic field at the heterojunction interface, thereby promoting a stronger generation of photocarriers and reducing the carrier transit time (Wang & Du, 2016). As a result, the modified device exhibits an enhanced photocurrent density of 7.68 mA cm−2, an improved responsivity of 42.67 mA W−1, and a detectivity of 1.478 × 10⁹ Jones. Moreover, the incorporation of plasmonic structures accelerates the photoresponse time by a factor of five relative to devices without such enhancement. These performance improvements underline the feasibility of employing topological insulator heterojunctions, in combination with plasmonic engineering, for applications in optical communications, high-speed electronics, and next-generation optoelectronic systems.
AB - Topological insulators continue to be promising candidates for broadband photodetection owing to their robust surface states and superior optoelectronic properties. Here, an advanced heterojunction photodetector composed of p-type Sb₂Te₃ and n-type Bi₂Te₃ is reported, whose performance is significantly enhanced through the integration of plasmonic grating electrodes. The plasmonic gratings concentrate the incident electromagnetic field at the heterojunction interface, thereby promoting a stronger generation of photocarriers and reducing the carrier transit time (Wang & Du, 2016). As a result, the modified device exhibits an enhanced photocurrent density of 7.68 mA cm−2, an improved responsivity of 42.67 mA W−1, and a detectivity of 1.478 × 10⁹ Jones. Moreover, the incorporation of plasmonic structures accelerates the photoresponse time by a factor of five relative to devices without such enhancement. These performance improvements underline the feasibility of employing topological insulator heterojunctions, in combination with plasmonic engineering, for applications in optical communications, high-speed electronics, and next-generation optoelectronic systems.
KW - heterojunction
KW - photodetector
KW - plasmonic grading electrodes
KW - topological insulator
UR - https://www.scopus.com/pages/publications/105011965750
U2 - 10.1002/adom.202501059
DO - 10.1002/adom.202501059
M3 - Article
AN - SCOPUS:105011965750
VL - 13
JO - Advanced Optical Materials
JF - Advanced Optical Materials
IS - 28
M1 - e01059
ER -